-Functional design at engineer level driving SW-based developments in a multidisciplinary agile development team. -Generate and maintain scripts and tools for pioneering novel flows and enabling efficient troubleshooting performance providing means to step through novel flows. -Realize improvements (technically and usability) of wafer measurements using scatterometry, this includes hardware, software and algorithm improvements of the scatterometry based metrology solutions. Manage to get the ultimate performance out of the newest (just introduced) platforms. -Invent, design and improve solutions for wafer metrology within the framework of lithography (scanner focus measurement) -Data and performance analysis. This with an overview of the entire value chain towards the customer. This includes the analysis of issues interfering with the accuracy of the (Focus) data.
-PhD in Engineering or Physics -Established experience in lithography, design/test of measurement systems or experimental setups in optical metrology or spectroscopy is a pre -Customer solution orientation and affinity with the development of workflows to be implemented in Software Application solutions.
-0-2 years experience in a relevant work environment within the industry
-Result oriented attitude; we are looking for a person that can work with set deadlines -Pragmatic approach; you should be capable of thinking in pragmatic solutions -Pro-active; it is expected that you take initiative to (help) drive progress -Strong communication skills in multi-disciplinary environment -Customer oriented attitude. Solving customer specific problems while keeping generic high volume solutions and maintainability in mind.
Michael Bailey International is acting as an Employment Business in relation to this vacancy.